Method for designing and making photolithographic reticle, reticle, and photolithographic process
US6465138B1 · kind B1 · utility
Inventor
Key dates
| Filing date | Aug 19, 1999 |
| Grant date | Oct 15, 2002 |
| Priority date | — |
| Expiry date | Aug 19, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/32
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
There are provided methods for making a reticle for use in a photolithography process, comprising forming at least two printable features on a reticle substrate, and forming at least one sub-resolution connecting structure on the reticle substrate, the sub-resolution connecting structure connecting at least two of the printable reticle features, as well as reticles formed according to such methods. In addition, there are provided computer-implemented methods for designing such a reticle, as well as computer readable storage media, computer systems and computer programs for use in making such reticles. In addition, there are provided photolithographic processes using such a reticle. The reticle may be a binary mask, a phase shift mask, or an attenuated phase shift mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.