William A. Stanton
73Patents
11h-index
25Co-inventors
78Inventor score
Filing activity: Feb 6, 1997 → Feb 24, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6120952A | Methods of reducing proximity effects in lithographic processes | Physics | 95 | Expired |
| US6238824A | Method for designing and making photolithographic reticle, reticle, and photolithographic process | Physics | 40 | Expired |
| US5932491A | Reduction of contact size utilizing formation of spacer material over resist pattern | Electricity | 27 | Expired |
| US7046339B2 | Optimized optical lithography illumination source for use during the manufacture of a semiconductor device | Physics | 27 | Expired |
| US6413684B1 | Method to eliminate side lobe printing of attenuated phase shift masks | Physics | 20 | Expired |
| US6319644A | Methods of reducing proximity effects in lithographic processes | Physics | 20 | Expired |
| US6284419A | Methods of reducing proximity effects in lithographic processes | Physics | 20 | Expired |
| US6214497A | Method to eliminate side lobe printing of attenuated phase shift masks | Physics | 19 | Expired |
| US6258489A | Mask design utilizing dummy features | Physics | 19 | Expired |
| US6465138B1 | Method for designing and making photolithographic reticle, reticle, and photolithographic process | Physics | 13 | Expired |
| US6803155B2 | Microlithographic device, microlithographic assist features, system for forming contacts and other structures, and method of determining mask patterns | Physics | 12 | Expired |
| US6376130B1 | Chromeless alternating reticle for producing semiconductor device features | Physics | 11 | Expired |
| US6894765B2 | Methods and systems for controlling radiation beam characteristics for microlithographic processing | Physics | 10 | Expired |
| US7858921B2 | Guided-mode-resonance transmission color filters for color generation in CMOS image sensors | Electricity | 10 | Active |
| US6401236B1 | Method to eliminate side lobe printing of attenuated phase shift | Physics | 9 | Expired |
| US6418008B1 | Enhanced capacitor shape | Electricity | 9 | Expired |
| US6807519B2 | Methods of forming radiation-patterning tools; carrier waves and computer readable media | Physics | 9 | Expired |
| US6245468A | Optical proximity correction methods, and methods of forming radiation-patterning tools | Physics | 8 | Expired |
| US7283205B2 | Optimized optical lithography illumination source for use during the manufacture of a semiconductor device | Physics | 7 | Expired |
| US6242816A | Method for improving a stepper signal in a planarized surface over alignment topography | Emerging Cross-Sectional Technologies | 6 | Expired |
| US7008738B2 | Microlithographic structures and method of fabrication | Physics | 5 | Expired |
| US6818910B2 | Writing methodology to reduce write time, and system for performing same | Electricity | 5 | Expired |
| US6369432B1 | Enhanced capacitor shape | Electricity | 5 | Expired |
| US7818710B2 | Method and system for lithographic simulation and verification | Emerging Cross-Sectional Technologies | 4 | Active |
| US6501188B1 | Method for improving a stepper signal in a planarized surface over alignment topography | Emerging Cross-Sectional Technologies | 4 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.