Projection exposure apparatus with a catadioptric projection optical system
US6466303B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 11, 1999 |
| Grant date | Oct 15, 2002 |
| Priority date | — |
| Expiry date | Jun 11, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70566
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A projection exposure apparatus (10) for forming an image of a pattern present on a first object such as a reticle (R) onto a second object, such as a wafer (W). The apparatus comprises along three optical axes (AZ1, AX, AZ2), an illumination optical system capable of illuminating the reticle with partially polarized light, and a catadioptric projection optical system (40-70) arranged adjacent the reticle and opposite the illumination optical system. The catadioptric projection optical system comprises one or more substantially spherical mirrors (48), a plurality of refractive members (42, 48, 72, 74), and one or more plane mirrors (60, 66). The plane mirrors are designed and arranged so as to allow a substantially unpolarized image of the reticle pattern, which is illuminated with partially polarized light, to be formed on the wafer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.