Method for producing a structure of interference colored filters
US6468703B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 18, 2000 |
| Grant date | Oct 22, 2002 |
| Priority date | — |
| Expiry date | Sep 12, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/286
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A process for the production of a color filter layer system structure on a substrate uses a structure lacquer layer which is deposited in a lift-off technique on the substrate. Lacquer layer surface regions and regions free of lacquer layer are present. Subsequently through a vacuum coating process a color filter layer system is deposited and subsequently with the lacquer layer surface regions the regions of the color filter layer system deposited thereon are removed. The deposition of the color filter layer system takes place through a plasma-enhanced coating at a temperature of maximally 150° C. The deposition takes place, for example, by sputtering or plasma-enhanced vapor deposition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.