Apparatus for removing impurities from effluent waste gas streams
US6471919B2 · kind B2 · utility
1Cited by
8References
31Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 16, 2001 |
| Grant date | Oct 29, 2002 |
| Priority date | — |
| Expiry date | May 16, 2021 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D2257/20
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An apparatus for removing fluorinated and chlorinated compounds contained in waste gas streams from semiconductor etch and deposition processes. The apparatus has a treatment chamber in which a plurality of liquid films are formed to absorb the fluorinated and chlorinated compounds contained in the waste gas streams that pass through the liquid films. The apparatus includes a tank for receiving the mixture of the absorbed fluorinated and chlorinated compounds and the liquid, and a dehumidifying device for stabilizing and dehumidifying the humidified waste gas streams.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.