Step mask
US6472766B2 · kind B2 · utility
9Cited by
12References
16Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 5, 2001 |
| Grant date | Oct 29, 2002 |
| Priority date | — |
| Expiry date | Jan 5, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/44
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A step mask having a plurality of test cells and a method for producing the same. Each test cell of the step mask is etched for a different amount of time and therefore has a different etch depth or height. The number of phase shifter layer etch iterations can be conducted on a column-by-column and row-by-row basis to decrease the number of etch iterations.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.