Patent · US Expired

Method and apparatus for evaluating the runability of a photomask inspection tool

US6482557B1 · kind B1 · utility

6Cited by
2References
12Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 24, 2000
Grant dateNov 19, 2002
Priority date
Expiry dateMar 24, 2020

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F1/84
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A method and apparatus evaluates the runability of a photomask inspection tool that inspects plural sets of die, each die having a standard simulated industrial device feature at plural technology nodes. A technology node size is determined for each feature at which inspection by the tool provides no false detection of faults. A sensitivity module included on a photomask test plate along with a runability module allows determination of inspection tool sensitivity and runability in a single test sequence.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.