Method for the production of multi-layer systems
US6483597B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 17, 2001 |
| Grant date | Nov 19, 2002 |
| Priority date | — |
| Expiry date | May 30, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K2201/067
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for the production of multi-layer systems with N layers having predetermined thickness, especially for the production of multi-layer systems for wavelength ranges in the extreme ultraviolet and soft X-ray wavelength range is described, in which N layers are deposited and if need be one or more layers are partially removed after deposited and in wich at the same time as deposition and/or removal of layers, the layers' reflectivity dependent on layer thickness is measured. The method includes the following steps:Calculation of a reflectivity-time curve of the multi-layer system to be producedDetermination of points in time ti (i=1, 2, . . . , N), at which the deposition of the i-th layer is to be stopped; and if need be determination of points in time ti′ (i=1, 2, . . . , N), at which the partial removal of the i-th layer is to be stopped, and at which the reflectivity at ti or ti′ is in the range of a turning point of the reflectivity-time curve;Calculation of parameters ki (i=1,2, . . . , N) for deposition and if need be ki′ (i=1,2, . . . , N) for partial removal,Deposition of the first layer with simultaneous reflectivity measurement; and calculation of …
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.