Frederik Bijkerk
16Patents
5h-index
33Co-inventors
66Inventor score
Filing activity: Dec 17, 1999 → Feb 10, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6452194B2 | Radiation source for use in lithographic projection apparatus | Electricity | 53 | Expired |
| US6656575B2 | Multilayer system with protecting layer system and production method | Emerging Cross-Sectional Technologies | 19 | Expired |
| US6469310B1 | Radiation source for extreme ultraviolet radiation, e.g. for use in lithographic projection apparatus | Physics | 15 | Expired |
| US7172788B2 | Optical element and method for its manufacture as well as lithography apparatus and method for manufacturing a semiconductor device | Emerging Cross-Sectional Technologies | 12 | Expired |
| US7261957B2 | Multilayer system with protecting layer system and production method | Emerging Cross-Sectional Technologies | 8 | Expired |
| US8411355B2 | Reflective optical element and method of manufacturing the same | Physics | 5 | Active |
| US6818912B2 | Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby | Electricity | 5 | Expired |
| US6667484B2 | Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby | Electricity | 4 | Expired |
| US9442383B2 | EUV-mirror arrangement, optical system with EUV-mirror arrangement and associated operating method | Physics | 3 | Active |
| US8638494B2 | Reflective optical element and method of manufacturing the same | Physics | 2 | Active |
| USRE41362E1 | Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby | General | 2 | Active |
| US9997268B2 | EUV-mirror, optical system with EUV-mirror and associated operating method | Physics | 1 | Active |
| US11360393B2 | Mirror, in particular for a microlithographic projection exposure system | Physics | 1 | Active |
| US10916356B2 | Reflective optical element | Physics | 0 | Active |
| US9733580B2 | Method for producing a reflective optical element for EUV-lithography | Physics | 0 | Active |
| US6483597B2 | Method for the production of multi-layer systems | Physics | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.