Method and apparatus for conserving energy within a process chamber
US6485603B1 · kind B1 · utility
5Cited by
11References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 1, 1999 |
| Grant date | Nov 26, 2002 |
| Priority date | — |
| Expiry date | Jul 1, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67103
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An apparatus for redirecting energy applied to a susceptor of a substrate process chamber. Specifically, a shield comprising one or more reflector members is disposed below said susceptor whereby thermal energy radiated from a backside of said susceptor is reflected back to the susceptor. The apparatus comprises a bracket member attached to the reflector members and a pedestal assembly disposed below said susceptor. The reflector members are fabricated from a low emissivity material such as stainless steel (which can be polished to a highly reflective condition). Also, the first and second reflector members can be annealed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.