Electronically controlled universal phase-shifting mask for stepper exposure system
US6486939B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | May 7, 2001 |
| Grant date | Nov 26, 2002 |
| Priority date | — |
| Expiry date | May 7, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70358
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A dynamic mask exposure system includes a support, a source of a beam, and a transmissive dynamic phase-shifting mask with orthogonally arranged matrices of actuator lines and binary pixel units which are opaque or transparent as a function of control inputs to the actuator lines. A control system is connected to supply pixel control signals to the actuator lines of the mask to form a pattern of transparent regions and opaque regions. The beam is directed onto the mask. A pattern detection element is located on the support. The beam passes through the transparent regions and projects a pattern from the mask onto the support or onto the image detection element. Where the image detection element is the target, there are means for providing signals representing the pattern to the control system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.