Method and procedure to automatically stabilize excimer laser output parameters
US6490307B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 23, 1999 |
| Grant date | Dec 3, 2002 |
| Priority date | — |
| Expiry date | Nov 23, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/036
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and apparatus is provided for stabilizing output beam parameters of a gas discharge laser by maintaining a constituent gas of the laser gas mixture at a predetermined partial pressure using a gas supply unit and a processor. The constituent gas of the laser gas mixture is provided at an initial partial pressure and the constituent gas is subject to depletion within the laser discharge chamber. A parameter such as time, pulse count, driving voltage for maintaining a constant laser beam output energy, pulse shape, pulse duration, pulse stability, beam profile, bandwidth of the laser beam, temporal or spatial coherence, discharge width, or a combination thereof, which varies with a known correspondence to the partial pressure of the constituent gas is monitored. Injections of the constituent gas are performed each to increase the partial pressure by a selected amount in the discharge chamber. A number of successive injections is performed at selected intervals to maintain the constituent gas substantially at the initial partial pressure for maintaining stable output beam parameters.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.