Positive photoresist composition and process and synthesizing polyphenol compound
US6492085B1 · kind B1 · utility
5Cited by
12References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 10, 2000 |
| Grant date | Dec 10, 2002 |
| Priority date | — |
| Expiry date | Aug 10, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/022
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides a positive photoresist composition including (A) an alkali-soluble resin and (B) a photosensitizer, and the ingredient (B) is a quinonediazide ester of, for example, 2,6-bis[4-hydroxy-3-(2-hydroxy-3,5-dimethylbenzyl)-2,5-dimethylbenzyl]-4-methylphenol, where the average degree of esterification of 20% to 80%.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.