Ken Miyagi
55Patents
12h-index
76Co-inventors
87Inventor score
Filing activity: Oct 6, 1982 → Jul 12, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4903067A | Multiimage forming apparatus | Electricity | 87 | Expired |
| US4912491A | Apparatus for forming superimposed images | Electricity | 62 | Expired |
| US4641197A | Image processing method or apparatus | Electricity | 55 | Expired |
| US4517606A | Apparatus for processing video signals | Electricity | 34 | Expired |
| US4739230A | Control device for controlling motor speed without hunting | Emerging Cross-Sectional Technologies | 23 | Expired |
| US4819066A | Image processing apparatus | Electricity | 23 | Expired |
| US4549219A | Image information transmission system | Electricity | 21 | Expired |
| US5115256A | Beam recorder with scan position control | Electricity | 19 | Expired |
| US4811109A | Image processing system | Electricity | 19 | Expired |
| US4829217A | Device for controlling movement of a rotating element | Physics | 16 | Expired |
| US4731657A | Control apparatus | Electricity | 14 | Expired |
| US4641199A | Image reading apparatus | Electricity | 12 | Expired |
| US7268061B2 | Substrate attaching method | Emerging Cross-Sectional Technologies | 11 | Expired |
| US5008760A | Image processing system | Electricity | 11 | Expired |
| US4605884A | Control unit | Emerging Cross-Sectional Technologies | 10 | Expired |
| US7358028B2 | Chemically amplified positive photo resist composition and method for forming resist pattern | Emerging Cross-Sectional Technologies | 6 | Expired |
| US4635129A | Image scanning apparatus | Electricity | 6 | Expired |
| US6492085B1 | Positive photoresist composition and process and synthesizing polyphenol compound | Physics | 5 | Expired |
| US4547628A | Data transmission system | Electricity | 4 | Expired |
| US8999631B2 | Primer and pattern forming method for layer including block copolymer | Emerging Cross-Sectional Technologies | 4 | Active |
| US6187500A | Positive photoresist compositions and multilayer resist materials using same | Chemistry; Metallurgy | 4 | Expired |
| US5864407A | Image processing system | Electricity | 3 | Expired |
| US8293392B2 | Battery holder for a battery array, and battery array | Emerging Cross-Sectional Technologies | 3 | Active |
| US9169421B2 | Method of producing structure containing phase-separated structure, method of forming pattern, and top coat material | Chemistry; Metallurgy | 3 | Active |
| US6207788A | Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resin | Physics | 2 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.