Phenolic/alicyclic copolymers and photoresists
US6492086B1 · kind B1 · utility
25Cited by
3References
2Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 8, 1999 |
| Grant date | Dec 10, 2002 |
| Priority date | — |
| Expiry date | Oct 8, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/111
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to new polymers that contain repeat units of phenol and photoacid-labile esters that contain an alicyclic group, preferably a bulky group that suitably may contain 7 to about 20 carbons, such as an alkyladamantyl, ethylfencyl, tricyclo decanyl, or pinanyl group. Polymers of the invention are useful as a component of chemically-amplified positive-acting resists.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.