Apparatus for photo exposure of materials with subsequent capturing of volatiles for analysis
US6495825B1 · kind B1 · utility
2Cited by
12References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 22, 1999 |
| Grant date | Dec 17, 2002 |
| Priority date | — |
| Expiry date | Dec 22, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/3595
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Real-time analysis of output volatiles upon UV exposure is achieved using a laboratory scale apparatus. The methods and apparatus use external or internal radiation sources, especially broad band external UV radiation. The apparatus and methods of the invention are especially useful in the analysis and screening of photoresist materials. The apparatus preferably uses FTIR or MS analysis.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.