Parameter editing method and semiconductor exposure system
US6499007B1 · kind B1 · utility
17Cited by
6References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 14, 1999 |
| Grant date | Dec 24, 2002 |
| Priority date | — |
| Expiry date | Jul 14, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70525
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In editing of a job parameter in a semiconductor exposure apparatus controlled by the job parameter, which is a collection of parameters, a first parameter set independent of the model of the semiconductor exposure apparatus and a second parameter set dependent upon the model are edited and saved independently. This makes it possible to improve operability of parameter editing and management in the semiconductor exposure apparatus, ease of maintenance thereof and the ability to use job parameters among various models of apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.