Method for patterning sensitive organic thin films
US6500604B1 · kind B1 · utility
25Cited by
6References
24Claims
0Family size
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Key dates
| Filing date | Jan 3, 2000 |
| Grant date | Dec 31, 2002 |
| Priority date | — |
| Expiry date | Jan 3, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/162
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A method for patterning a chemically sensitive organic thin film such as pentacene comprising (a) forming a protective material layer on the surface of a chemically sensitive organic thin film, said protective material layer being chemically resistant; (b) forming a photoresist on an exposed surface of said protective material layer; (c) patterning the photoresist; and (d) transferring the pattern to the protective material layer and the chemically sensitive organic thin film by dry etching.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.