Purge monitoring system for gas discharge laser
US6504860B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 18, 2001 |
| Grant date | Jan 7, 2003 |
| Priority date | — |
| Expiry date | May 22, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/2207
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A laser component purge system for discharge lasers. The LNP, the output coupler and the wavemeter are contained in sealed chambers each having a purge inlet port and a purge outlet port. Purge gas such as N2 is directed to each of the inlet ports. A purge monitoring system is provided which monitors the purge flow and provides one or more signals to a processor which is programmed to minimize laser timeouts attributable to purge conditions without endangering the purged optical components. In a preferred embodiment, gas exiting the outlet ports are directed to flow monitors which provide the one or more signals to the processor. Purge gas may be exhausted or recirculated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.