Method and apparatus employing external light source for endpoint detection
US6509960B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 28, 2001 |
| Grant date | Jan 21, 2003 |
| Priority date | — |
| Expiry date | Feb 28, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/335
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and apparatus for endpoint detection for the stripping of a particular material, such as photo-resist material, from a substrate surface. A beam of light is projected onto the substrate surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a control mechanism which determines the proper disposition of the substrate. The control mechanism controls the cessation of the stripping process and may control a substrate-handling device which sequentially transfers substrates to and from a stripping chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.