Apparatus and method to control the molecular weight distribution of a vapor
US6511702B1 · kind B1 · utility
4Cited by
14References
15Claims
0Family size
Assignee
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Key dates
| Filing date | Nov 9, 2000 |
| Grant date | Jan 28, 2003 |
| Priority date | — |
| Expiry date | Nov 9, 2020 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D5/083
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method and apparatus to provide a substantially steady-state concentration of one or more molecular components, each molecular component having a different vapor pressure, to a vapor deposition chamber. Particularly, the method and apparatus will provide one or more molecular components whose concentration in the vapor deposition chamber, that is, whose weight average molecular weight does not vary with time by more than 50%, preferably by no more than 70%, during deposition of a particular lubricant.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.