SMIF container including an electrostatic dissipative reticle support structure
US6513654B2 · kind B2 · utility
14Cited by
9References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 10, 2001 |
| Grant date | Feb 4, 2003 |
| Priority date | — |
| Expiry date | Jul 10, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67396
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The present invention is a support structure for supporting a reticle or silicon wafer. The support structure includes a support column and a retaining structure. In addition to retaining a wafer, the present invention also creates a discharge path to remove electrostatic charges from the wafer. The retaining structure mechanically engages each support column to create a discharge path from the wafer to a ground. Specifically, electrostatic charges that dissipate from the wafer travel along the support structure to the support column and exit the SMIF pod through the pod door.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.