Semiconductor device and process for the same
US6515349B2 · kind B2 · utility
21Cited by
5References
9Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 7, 2001 |
| Grant date | Feb 4, 2003 |
| Priority date | — |
| Expiry date | Mar 7, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D64/252
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The main purpose is to provide a semiconductor device which has a field plate wherein the electric field concentration at a step part can be eliminated and a higher withstanding voltage can be gained.A field plate is provided on a substrate. The field plate has a step part which bends toward the downward direction from the surface of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.