Air management system and method for chemical containment and contamination reduction in a semiconductor manufacturing facility
US6517594B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 4, 2001 |
| Grant date | Feb 11, 2003 |
| Priority date | — |
| Expiry date | Apr 4, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S55/29
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An air manager and/or chemical containment apparatus, for environmental control of fumes from wet bench units of semiconductor manufacturing facilities. The air manager system is suitable for installation in an open architecture wet bench or an enclosed mini-environment wet bench, and includes an air source and an air exhaust arranged for flowing air across an open chemical tank, to entrain fumes from chemical in the tank that otherwise may migrate from the immediate vicinity of the tank, and transport such fumes to the exhaust with the air flowed from the air source to the exhaust. The chemical containment apparatus includes: (1) a thin film member including at least one solid portion and at least one cut-out portion; (2) a first scroll member positioned at one side of the thin film member for rotatorily moving the thin film member; (3) a motive driver operatively connected to the first scroll member for rotating the first scroll member; and (4) optionally, a second scroll member positioned at the other side of said thin film member for rotatorily receiving said thin film in synchrony with movement of the first scroll member.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.