Novolac polymer planarization films with high temperature stability
US6517951B2 · kind B2 · utility
8Cited by
37References
12Claims
0Family size
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Key dates
| Filing date | Dec 12, 2000 |
| Grant date | Feb 11, 2003 |
| Priority date | — |
| Expiry date | Dec 12, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31942
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A process for forming a planarization film on a substrate that does not smoke or fume on heating includes applying a polymeric solution including a novolac resin having a weight average molecular weight between about 1000 and 3000 amu, which has been fractionated to remove molecules with molecular weight below about 350 amu, a surfactant selected from a group consisting of a non-fluorinated hydrocarbon, a fluorinated hydrocarbon and combinations thereof, and an optional organic solvent to a substrate, followed by heating the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.