Multiple inclined wafer holder for improved vapor transport and reflux for sealed ampoule diffusion process
US6520348B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 4, 2000 |
| Grant date | Feb 18, 2003 |
| Priority date | — |
| Expiry date | Apr 4, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/138
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An apparatus and method for diffusion annealing impurities onto a plurality of wafers is described. A hollow wafer holder includes a plurality of first and second slots. The first slots are sized and shaped to receive a pair of wafers. The first slots are angled relative to a longitudinal axis of the wafer holder. The wafer holder is positioned at a first location within an ampoule, with a diffusion source being positioned at a second location within the ampoule. The ampoule is sealed and placed within or near a heat source. The heat source alters the physical state of the diffusion source to allow the entrained impurities to diffuse throughout the ampoule. The inclination of the first slots allows a sufficient clearance between the wafers and the ampoule to allow impurities within a gaseous diffusion source to extend throughout the ampoule. The presence of the second slots allows a more uniform diffusion of the impurities to the wafers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.