Optical arrangement having improved temperature distribution within an optical element

US6521877B1 · kind B1 · utility

Assignee

• Carl Zeiss Stiftung · DE

Inventors

• Werner Müller-Rissmann · Oberkochen, DE
• Hubert Holderer · Oberkochen, DE
• Rudolf Von Bünau · Mountain View, US
• Christian Wagner · Rosenheim, DE
• Jochen Becker · Oberkochen, DE
• Stefan Xalter · Oberkochen, DE
• Wolfgang Hummel · Dresden, DE

Key dates

• Filing date: Nov 22, 2000
• Grant date: Feb 18, 2003
• Expiry date: Feb 14, 2021

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70891
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

An optical arrangement, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. A refractive optical element, e.g. a lens (2), is heated by the rotationally non-symmetrical radiated impingement (3) of a light source. At least one electric heating element is coupled to the optical element. Said heating element comprises a resistance heating coating carried by the optical element. In the region of the surface (3) of the optical element acted upon by the radiation of the light source the resistance heating coating is substantially optically transparent. It comprises a plurality of parallel, electrically mutually insulated coating strips (5 to 10). A heating current source (17 to 19) is additionally part of the heating element. By virtue of the combined heating of the optical element by the radiated impingement (3) and the resistance heating, a correction of imaging defects induced by illumination in the optical element is achieved by means of a symmetrical and/or homogeneous temperature and refractive index distribution.