Stefan Xalter
34Patents
9h-index
63Co-inventors
78Inventor score
Filing activity: Nov 22, 2000 → Dec 17, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6504597B2 | Optical arrangement | Physics | 29 | Expired |
| US6521877B1 | Optical arrangement having improved temperature distribution within an optical element | Physics | 18 | Expired |
| US6781668B2 | Optical arrangement | Physics | 17 | Expired |
| US6844994B2 | Optical element deformation system | Physics | 16 | Expired |
| US6522392B1 | Optical systems and methods of compensating rotationally non-symmetrical image defects in an optical system | Physics | 16 | Expired |
| US9013684B2 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Emerging Cross-Sectional Technologies | 15 | Active |
| US6466382B2 | Optical arrangement | Physics | 14 | Expired |
| US6583850B2 | Optical system | Physics | 10 | Expired |
| US6897599B2 | System for damping oscillations | Physics | 10 | Expired |
| US6700715B2 | Oscillation damping system | Physics | 9 | Expired |
| US8339577B2 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Emerging Cross-Sectional Technologies | 6 | Active |
| US7760327B2 | Reflecting optical element with eccentric optical passageway | Physics | 3 | Active |
| US7929227B2 | Optical assembly | Physics | 3 | Active |
| US7589921B2 | Actuator device | Physics | 3 | Active |
| US7684125B2 | Diaphragm changing device | Physics | 3 | Expired |
| US7791826B2 | Optical assembly | Physics | 2 | Active |
| US8089707B2 | Diaphragm changing device | Physics | 1 | Active |
| US8659745B2 | Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations | Physics | 1 | Active |
| US9239229B2 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Emerging Cross-Sectional Technologies | 1 | Active |
| US9897925B2 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Emerging Cross-Sectional Technologies | 1 | Active |
| US8269947B2 | Optical system for semiconductor lithography | Physics | 1 | Active |
| US8018664B2 | Housing structure | Physics | 1 | Expired |
| US9804500B2 | Optical imaging arrangement with simplified manufacture | Physics | 0 | Active |
| US8570676B2 | Optical assembly | Physics | 0 | Active |
| US9001309B2 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Emerging Cross-Sectional Technologies | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.