Patent · US Expired

Fused silica pellicle

US6524754B2 · kind B2 · utility

19Cited by
34References
36Claims
0Family size

Assignee

Inventor

Key dates

Filing dateJan 22, 2001
Grant dateFeb 25, 2003
Priority date
Expiry dateFeb 18, 2021

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F1/62
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A fused silica pellicle for use on photomasks having increased durability and improved transmission uniformity and birefringence properties. The pellicle may be secured to the photomask using an adhesive or a slide rail system, or may be held in place using a static charge.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.