Optical transparent film and sputtering target for forming optical transparent film
US6528442B1 · kind B1 · utility
38Cited by
2References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 7, 2000 |
| Grant date | Mar 4, 2003 |
| Priority date | — |
| Expiry date | Dec 7, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B2007/25715
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
To provide an optically transparent film containing 0.01 to 20% by weight glass forming oxide consisting of Nb2O5, V2O5, B2O3, SiO2, and P2O6; 0.01 to 20% by weight Al2O3 or Ga2O3; and 0.01 to 5% by weight hard oxide of ZrO2 and TiO2 as required; balance being ZnO, and a sputtering target for forming such a film. This sputtering target reduces occurrence of particles during sputtering, decreases the number of interruption or discontinuance of sputtering to improve production efficiency, and forms a protective film for optical disks with large transmittance and low reflectance.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.