Power supply with flux-controlled transformer
US6532161B2 · kind B2 · utility
6Cited by
10References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 13, 2001 |
| Grant date | Mar 11, 2003 |
| Priority date | — |
| Expiry date | Nov 13, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01F2019/085
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
There is provided by this invention an apparatus and method for generating voltage pulses to first and second magnetron devices in a plasma chamber. An isolation transformer is connected to a pulsed DC power supply having a flux sensor, such as a Hall effect sensor, in close proximity to its air gap to monitor the transformer flux. A control circuit is connected to the flux sensor to control the duty cycle of the transformer by controlling the flux of the transformer such that the maximum and minimum peak transformer fluxes are equal in magnitude and opposite in sign to prevent saturation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.