Metal-insulator-semiconductor photocell and imager
US6534808B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 11, 2001 |
| Grant date | Mar 18, 2003 |
| Priority date | — |
| Expiry date | Jan 11, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10F30/2823
Abstract
A photocell for detecting light includes at least two tiers or structures, one disposed over the other, each tier having a metal-insulator-semiconductor (M-I-S) or a semiconductor-insulator-metal (S-I-M) structure. Each M-I-S structure includes a semiconductor diffusion layer capable of developing a depletion region, a thin insulator layer disposed on the diffusion layer, and a contact layer disposed on the thin insulator layer. Each S-I-M structure includes a contact layer, a thin insulator layer disposed on the contact layer, and a semiconductor diffusion layer disposed on the thin insulator layer, the semiconductor layer capable of developing a depletion region. When light is incident on each depletion region, a current indicative of the light detected in each depletion region flows through the respective contact layer. Also provided is a semiconductor-insulator-metal (S-I-M) structure that detects light. Two- and three-tiered photocells made of M-I-S and/or S-I-M structures are also provided. Three-tiered photocells are able to detect blue, green, and red components of incident light. These photocells may be arranged in an array to form a photo-imager.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.