Manufacture of silica waveguides with minimal absorption
US6537623B2 · kind B2 · utility
7Cited by
12References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 7, 2001 |
| Grant date | Mar 25, 2003 |
| Priority date | — |
| Expiry date | Apr 5, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B2006/12169
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An improved high temperature chemical treatment of deposited silica films wherein they are subjected to a reactive ambient comprising hydrogen and oxygen atoms. This method results in better elimination of residual undesirable oscillators so as to provide improved optical quality silica waveguides with reduced optical absorption.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.