Patent · US Expired

Device and method for handling individual wafers

US6540468B1 · kind B1 · utility

18Cited by
2References
12Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 17, 2001
Grant dateApr 1, 2003
Priority date
Expiry dateApr 17, 2021

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S414/141
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

An apparatus and a method for handling individual wafers (2) that are temporarily in an essentially horizontal position. The apparatus (1) comprises at least one supporting part (5) with supporting areas (6), comprising at least three supporting points (9), for supporting an edge region of the wafer, and at least one holding part (7) with holding areas (8), comprising at least two holding points (10), for gripping the edge (4) of this wafer (2), with the holding points (10) being moveable relative to the supporting points (9) and, to grasp the wafer (2), relative to one another. Moreover, at least one of these holding points (10) is arranged on a rotatable rod (12) designed, for reliable holding of the wafer, as a holding part (7), with rod (12) extending coaxially with an axis (11) running through the wafer center (3) and essentially parallel to the surface of the wafer (2).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.