Particle beam current monitoring technique
US6541780B1 · kind B1 · utility
11Cited by
13References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 28, 1998 |
| Grant date | Apr 1, 2003 |
| Priority date | — |
| Expiry date | Jul 28, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31703
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method of monitoring particle beam current in an ion implanter in which the ion beam is analyzed to separate it into a separate sub-beam for each ion charge state. At least one sub-beam, having a charge state different from the desired charge state, is intercepted, and the current of the intercepted sub-beam is measured. This current is useful as an estimate of the current of the desired sub-beam which is used for the implantation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.