Process control system
US6542830B1 · kind B1 · utility
Assignees
Inventors
Key dates
| Filing date | Sep 10, 1998 |
| Grant date | Apr 1, 2003 |
| Priority date | — |
| Expiry date | Sep 10, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A process management system in accordance with the present invention includes inspection apparatuses for inspecting defects on a wafer, the inspection apparatuses being connected through a communication network, inspection information and image information obtained from these inspection apparatuses being collected to construct a data base and an image file, therein definition of defects is given by combinations of elements which characterize the defect based on the inspection information and the image information obtained from the inspection apparatuses. By giving definition of the defect, characteristics of the defect can be subdivided and known. Therefore, the cause of a defect can be studied.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.