Apparatus and method for creating an ultra-clean mini-environment through localized air flow augmentation
US6543981B1 · kind B1 · utility
9Cited by
6References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 30, 2001 |
| Grant date | Apr 8, 2003 |
| Priority date | — |
| Expiry date | Mar 30, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/14
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for creating a reduced particle environment in a localized area of a mechanically active transport interface is provided. The augmentation of the air flow results in a sweeping air flow to remove particles in and around the desired area. The augmented air, flow will eliminate static or turbulent air flow regions and assist in removing potential particles from the vicinity of the substrate. This will prevent particles from being deposited on substrates thus fostering higher yields and improved quality.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.