Method of manufacturing a device by means of a mask phase-shifting mask for use in said method
US6544694B2 · kind B2 · utility
7Cited by
8References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 29, 2001 |
| Grant date | Apr 8, 2003 |
| Priority date | — |
| Expiry date | May 17, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/32
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method is described for imaging, by means of projection radiation, a phase-shifting mask pattern on a substrate for the purpose of configuring device features in the substrate. By using a mask pattern comprising mask features constituted by a phase transition (22) and two sub-resolution assist features (40,41), arranged symmetrically with respect to the phase transition and having a mutual distance (p), device features having a wide variety of widths can be obtained by varying only the mutual distance.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.