Patent · US Expired

Method of cleaning a semiconductor wafer with a cleaning brush assembly having a contractible and expandable arbor

US6551410B2 · kind B2 · utility

10Cited by
2References
12Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 15, 2000
Grant dateApr 22, 2003
Priority date
Expiry dateApr 3, 2021

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB08B1/34
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

A method of cleaning a semiconductor wafer using a cleaning brush assembly having an arbor with: (1) an expandable member configured to have a non-expanded position and an expanded position, and (2) a cleaning brush, located about the expandable member, having an inner diameter greater than an outer diameter of the expandable member in the non-expanded position and less than an outer diameter of the expandable member in the expanded position.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.