Patent · US Expired

System and method for providing a lithographic light source for a semiconductor manufacturing process

US6552350B2 · kind B2 · utility

3Cited by

15References

27Claims

0Family size

Assignee

Advanced Energy Systems, Inc. · US

Inventors

Edwin G. Haas · Sayville, US
Robert M. Gutowski · Floral Park, US
Vincent S. Calia · Greenlawn, US

Key dates

Filing date	Jan 12, 2001
Grant date	Apr 22, 2003
Priority date	—
Expiry date	Sep 7, 2021

Classification

Technology area (CPC F)Mechanical Engineering; Lighting; Heating
CPC primaryF25J2205/20
WIPO fieldMedical technology
WIPO sectorInstruments

Abstract

A method for providing a lithographic light source is provided that includes producing a process fluid plume. A coaxial shielding fluid is produced around the process fluid plume. A plasma is generated by providing an energy source that impinges on the process fluid plume.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.