Pupil filtering for a lithographic tool
US6555274B1 · kind B1 · utility
18Cited by
1References
20Claims
0Family size
Inventors
Key dates
| Filing date | Feb 1, 2001 |
| Grant date | Apr 29, 2003 |
| Priority date | — |
| Expiry date | Mar 21, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70308
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A mask or reticle is optimized for use in a lithographic system. The mask or reticle includes a substrate and a pupil filter pattern. The substrate includes an IC pattern representing at least one integrated circuit feature. The pupil filter pattern can enhance the resolution associated with the lithographic system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.