Inventor · Pleasanton, CA, US

Jongwook Kye

88Patents
13h-index
60Co-inventors
83Inventor score

Filing activity: Sep 14, 2000 → Jan 4, 2018

Most-cited inventions

PatentTitleAreaCited byStatus
US6489068B1 Process for observing overlay errors on lithographic masks Physics 63 Expired
US8889561B2 Double sidewall image transfer process Electricity 39 Active
US7315033B1 Method and apparatus for reducing biological contamination in an immersion lithography system Physics 38 Expired
US8741763B2 Layout designs with via routing structures Electricity 32 Active
US8954913B1 Methods of generating circuit layouts that are to be manufactured using SADP routing techniques and virtual non-mandrel mask rules Physics 30 Active
US8921225B2 Method for off-grid routing structures utilizing self aligned double patterning (SADP) technology Electricity 18 Active
US6555274B1 Pupil filtering for a lithographic tool Physics 18 Expired
US8581348B2 Semiconductor device with transistor local interconnects Electricity 17 Active
US6829040B1 Lithography contrast enhancement technique by varying focus with wavelength modulation Physics 17 Expired
US8881083B1 Methods for improving double patterning route efficiency Electricity 16 Active
US9437588B1 Middle of-line architecture for dense library layout using M0 hand-shake Electricity 15 Active
US9818651B2 Methods, apparatus and system for a passthrough-based architecture Electricity 14 Active
US6399401B1 Test structures for electrical linewidth measurement and processes for their formation Emerging Cross-Sectional Technologies 14 Expired
US9431300B1 MOL architecture enabling ultra-regular cross couple Electricity 13 Active
US6556286B1 Inspection system for the pupil of a lithographic tool Physics 13 Expired
US8918746B1 Cut mask aware contact enclosure rule for grating and cut patterning solution Electricity 13 Active
US9324722B1 Utilization of block-mask and cut-mask for forming metal routing in an IC device Electricity 12 Active
US6710853B1 Phase grating focus monitor using overlay technique Physics 12 Expired
US9105510B2 Double sidewall image transfer process Electricity 12 Active
US9202751B2 Transistor contacts self-aligned in two dimensions Electricity 11 Active
US9147653B2 Method for off-grid routing structures utilizing self aligned double patterning (SADP) technology Electricity 11 Active
US8802574B2 Methods of making jogged layout routings double patterning compliant Physics 11 Active
US6602794B1 Silylation process for forming contacts Electricity 10 Expired
US8839168B2 Self-aligned double patterning via enclosure design Physics 10 Active
US6535280B1 Phase-shift-moiré focus monitor Physics 10 Expired

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.