Defect inspection method and apparatus therefor
US6556290B2 · kind B2 · utility
40Cited by
10References
38Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 5, 2001 |
| Grant date | Apr 29, 2003 |
| Priority date | — |
| Expiry date | Mar 5, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/956
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A defect inspection apparatus for inspecting a fine circuit pattern with high resolution to detect a defective portion is constructed to have an objective lens for detecting an image of a sample, a laser illumination unit for illuminating the sample through the objective lens, a unit for reducing the coherence of the laser illumination, an accumulation type detector, and a unit for processing the detected image signal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.