Method of using amorphous carbon as spacer material in a disposable spacer process

US6559017B1 · kind B1 · utility

Assignee

• Advanced Micro Devices, Inc. · US

Inventors

• David E. Brown · Pleasant Valley, US
• Philip A. Fisher · Foster City, US
• Richard J. Huang · Cupertino, US
• Richard Nguyen · Fremont, US
• Cyrus E. Tabery · Sunnyvale, US

Key dates

• Filing date: Jun 13, 2002
• Grant date: May 6, 2003
• Expiry date: Jun 13, 2022

Classification

• Technology area (CPC H): Electricity
• CPC primary: H10D30/601

Abstract

A method of using amorphous carbon as spacer material in a disposable spacer process can include forming amorphous carbon spacers at lateral side walls of a gate structure over a substrate, implanting dopants in the substrate to form source and drain regions, ashing away the amorphous carbon spacers, and implanting dopants to form shallow structures in the substrate.