Patent · US Expired

Reticle storage and retrieval system

US6562094B2 · kind B2 · utility

349Cited by
1References
46Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 6, 2001
Grant dateMay 13, 2003
Priority date
Expiry dateJul 6, 2021

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S414/135
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A storage and retrieval system is provided for safely and efficiently storing reticles in a clean environment. An enclosed storage unit is provided for storing the reticles, and other items such as wafers and the like, in an environment which minimizes the amount of contaminants and is suitable for use in a semiconductor fabrication clean room. A retrieval unit is provided separate from the enclosed storage unit for accessing and staging the reticles before they enter and leave the storage unit for minimizing exposure of the storage unit. The storage unit includes a movable storage matrix having a plurality of bays for storing the reticles. The movable storage matrix is selectively moved or rotated by a drive mechanism that is located external to the storage unit so that the storage unit is substantially free of contaminant generating components.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.