Crystal growing device and method of manufacturing single crystal
US6562134B1 · kind B1 · utility
Assignees
Inventors
Key dates
| Filing date | Jun 15, 2001 |
| Grant date | May 13, 2003 |
| Priority date | — |
| Expiry date | Jun 15, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T117/1096
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A crystal growth apparatus comprising a heating furnace capable of controlling uniformly the temperature distribution in the same horizontal plane, and a method for producing a single crystal by using the crystal growth apparatus are provided. In the crystal growth apparatus comprising a cylindrical heating furnace (110) having plural heaters (101, 102, 103 and 104) laminated in multi-stage in an axial direction (Z), each heater is disposed for the terminal portions of the adjacent heaters not to be overlapped in the same position, but to be in a mutually separated position, seeing from the axial direction of the heating furnace. Concretely, in case of N (n is a positive integer of three or more) heaters, each heater (101, 102, 103 and 104) is disposed for the terminal portions (110a, 102a, 103a and 104a) of the heaters to be located at each apex of a regular n-gon (n is an integer satisfying 3≦n≦N), seeing from the axial direction Z of the heating furnace.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.