Process for cleaning ceramic articles
US6565667B2 · kind B2 · utility
15Cited by
28References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 2, 2001 |
| Grant date | May 20, 2003 |
| Priority date | — |
| Expiry date | Jul 2, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method for cleaning an inorganic surface of a virgin semiconductor processing component by directing a flow of frozen CO2 pellets upon the surface. After cleaning, the component is packaged for transport and installation into a furnace used for processing semiconductor wafers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.