Andrew G. Haerle
21Patents
5h-index
17Co-inventors
66Inventor score
Filing activity: Sep 29, 1995 → Apr 12, 2018
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6296716A | Process for cleaning ceramic articles | Emerging Cross-Sectional Technologies | 43 | Expired |
| US6162543A | High purity siliconized silicon carbide having high thermal shock resistance | Emerging Cross-Sectional Technologies | 26 | Expired |
| US6565667B2 | Process for cleaning ceramic articles | Emerging Cross-Sectional Technologies | 15 | Expired |
| US9120200B2 | Polishing slurry including zirconia particles and a method of using the polishing slurry | Emerging Cross-Sectional Technologies | 7 | Active |
| US6403155B2 | High purity, siliconized silicon carbide having high thermal shock resistance | Emerging Cross-Sectional Technologies | 6 | Expired |
| US6554909B1 | Process for cleaning components using cleaning media | Emerging Cross-Sectional Technologies | 5 | Expired |
| US8980113B2 | Chemical mechanical planarization using nanodiamond | Electricity | 4 | Active |
| US6723437B2 | Semiconductor processing component having low surface contaminant concentration | Emerging Cross-Sectional Technologies | 3 | Expired |
| US7053411B2 | Method for treating semiconductor processing components and components formed thereby | Emerging Cross-Sectional Technologies | 3 | Expired |
| US8685123B2 | Abrasive particulate material, and method of planarizing a workpiece using the abrasive particulate material | Chemistry; Metallurgy | 3 | Active |
| US9343321B2 | Chemical mechanical planarization using nanodiamond | Electricity | 3 | Active |
| US8105135B2 | Polishing slurries | Emerging Cross-Sectional Technologies | 3 | Active |
| US6825123B2 | Method for treating semiconductor processing components and components formed thereby | Emerging Cross-Sectional Technologies | 3 | Expired |
| US7993420B2 | Ceria material and method of forming same | Chemistry; Metallurgy | 3 | Active |
| US6881262B1 | Methods for forming high purity components and components formed thereby | Chemistry; Metallurgy | 3 | Expired |
| US8216328B2 | Ceria material and method of forming same | Chemistry; Metallurgy | 1 | Active |
| US5599407A | Method for estimating inclusion content of metals using reflectance | Physics | 0 | Expired |
| US10640680B2 | Chemical-mechanical processing slurry and methods | Electricity | 0 | Active |
| US8343415B2 | Ceramic particulate material and processes for forming same | Emerging Cross-Sectional Technologies | 0 | Active |
| US9410063B2 | Polishing slurry including zirconia particles and a method of using the polishing slurry | Emerging Cross-Sectional Technologies | 0 | Active |
| US7727919B2 | High resistivity silicon carbide | Chemistry; Metallurgy | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.