Apparatus and method for compensating critical dimension deviations across photomask
US6566016B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Jun 28, 2000 |
| Grant date | May 20, 2003 |
| Priority date | — |
| Expiry date | Oct 16, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70191
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides an apparatus and a method for compensating critical dimension deviations across a photomask. In this method, a photomask is partitioned into a plurality of regions. A critical dimension is then measured for each of the regions in the photomask. Based on the measured critical dimensions, a deviation map is generated to map deviation of the critical dimension from a target dimension for each of the regions in the photomask. From the deviation map, an amount of actinic radiation needed to be attenuated to compensate for the critical dimension deviation from the target dimension is determined for each of the regions of the photomask. Based on the determined attenuation amount of actinic radiation, the transmission of the actinic radiation through each of the regions in the photomask is attenuated such that the critical dimension deviation is compensated to the target dimension for each of the regions in the photomask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.