Fluoropolymer-coated photomasks for photolithography
US6566021B2 · kind B2 · utility
13Cited by
19References
22Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jul 26, 2001 |
| Grant date | May 20, 2003 |
| Priority date | — |
| Expiry date | Jul 26, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/48
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Photomasks for photolithographic processes are described that incorporate a protective amorphous poly(fluorocarbon) film on their surface, the film serving to reduce contamination at the photomask surface. The preparation of the coated photomasks is also described, as is their use in a photolithographic process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.